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  • Sputtering Targets For Flat Panel Display - China

    price: contact company for price

    China Rare Metal Material Co., Ltd produce kinds of sputtering targets

    for flat panel display as below:

    Alumina doped Zinc Oxide sputtering targets (AZO),

    Tin doped indium Oxide sputtering target (ITO)

    Niobium Oxide sputtering target(Nb2O5, NbOx)

    Magnesium fluoride sputtering target (MgF2)

    Molybdenum Niobium sputtering target (MoNb), Mo(90)Nb(10)wt%

    Antimony dopedTin Oxide sputtering target , ATO(Sb2O3:SnO2)

    Silicon sputtering target (Si)

    Silicon Aluminum sputtering target (SiAl)

    Titanium Oxide sputtering target (TiOx, TiO2, TiO )

    Niobium doped Titanium Oxide sputtering target (TiOxNb)

    biggest size: Disc 18 inch(457.2mm) diameter

    Rectangle :450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm

    Relative Density: 99%min

    produce way: hot pressing

    Production Capacity: about 1000kg per month

    Company Contact:

    • Phone: 008679188101311

    • Address: Unit 1208-1212,HongGu JingDian Building, No.1376 H, Nanchang City, China

    • Email: Email

    Published date: November 30, 2013 -

    • Business Description: China Rare Metal Material Co., Ltd(CRM) established in 2004 year,
      locate in China Mainland; With two large fully equipped factories, two sales companies.
      CRM (China Rare Metal Material Co., Ltd.) Focus on export international market
      HaiTe (Jiangxi HaiTe Advanced Material Co., Ltd.) Focus on only China market
      KeTai ( Jiangxi Ketai Advanced Materials Co., Ltd.) Focus on manufacture

      CRM specializes in production, R&D of new materials and products. Taking the market as
      guidance, talents and technology as base, in order to meet urgent needs of new materials at
      home and abroad, we adjust product structure and production process internally and keep up
      with market s trends externally. As a company with strong comprehensive power and
      flourishing prospects, we are continuously researching and developing new materials and
      products applicable to current needs.

      The products include special ceramics, elemental metals, alloys, semiconductor compounds
      and a variety of complex new materials (purity from low to high, up to 99.99999%), especially
      magnetron sputtering targets, vacuum coating materials, high purity compound semiconductor
      materials, distilled rare earth metals, rare earth alloys, rare earth fluoride and special alloys
      have great advantages.

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