Ultra High Vacuum Systems - USA

It supports Magnetron Sputtering for ITO Film and Seed Layer Based Process.

1 - The system includes one load-lock chamber and multiple sputtering chambers.

2 - Load-lock chamber is equipped with ion milling, RF plasma cleaning, gas passivation.

3 - Equipped with fully automatic operation interface.

Working Principles

Ion Bombardment: Plasma ions accelerate toward a target, dislodging atoms by momentum transfer.

Magnetic Confinement: Magnetic fields trap electrons near the target, increasing plasma density and reducing ionization losses.

Reactive Sputtering: Introduction of reactive gases (e.g., O₂, N₂) allows for compound film deposition (oxides, nitrides).

Thermal Efficiency: The target remains relatively cool, which supports deposition of high-melting-point materials without excessive heating.

UHV Chamber & System Characteristics

The system supports multiple UHV sputtering chambers plus a load-lock chamber for efficient sample loading.

Base pressure can reach ≤ 3 E-9 Torr, enabling ultra-clean film growth.

Process temperature range spans from room temperature up to 900 °C, enabling thermal processing or elevated-temperature depositions.

Modular chamber architecture supports multi-layer structures, such as Nb/Al-AlOx/Nb, Al/AlOx/Al, or even α-Ta/TaOx/α-Ta junctions.

Wafer Transfer: Highly reliable and repeatable substrate transferring capability Uniformity: Sheet Resistance Uniformity 1 Sigma NU%<±5% (4 inch wafer with 5 mm removal from the edge)

Company Contact:

• Posted By: YM ZLD Technology Inc.

• Phone: 512-228-0499

• Address: Office 6388 Almaden Rd, San Jose, California , USA

• Email:

• Website: https://www.zldtechnology.com/

• Business Description: Located in Silicon Valley, with over 30 years' experience in advanced thin film equipment business, YM ZLD provides customized state of art process equipment, targeting R&D and production in areas of novel semiconductor, alternative energy, optoelectronics and emerging applicaitons.
  
  With YM ZLD, we help you with new discovery.