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Planar Metal Sputtering Targets - China
price: contact company for price
Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc.
High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.
We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals.
Also have controlled specific impurities within the target
High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of materials.
Uniform grain: Controlled grain size and direction
Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality.
Company Contact:
- Posted By: Fujian Acetron New Materials CO. , Ltd
- Phone: 86-15375906883
- Address: No.66 Zhanghu Rd, Zhang'gang Sub-Dist, Fuzhou , Fujian , China
- Email:
- Website: https://www.acetron.net/
Published date: June 4, 2024
- Business Description: Fujian Acetron New Materials Co., Ltd, founded in 2002, is a comprehensive company integrated with R& D, manufacturing and selling of PVD coating materials, mainly engages in sputtering target, evaporation material and evaporation accessories for high precision optical lenses& Optical communication, semiconductors, LOW-E glass& Automotive glass, LCD display & touch panel and surface decoration.
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