12 Singapore 
3 Vietnam 
3 France 
2 Korea 
2 Ukraine 
1 Germany 
1 Brazil 
1 India 
1 Canada 
1 China 
1 Finland 
1 Argentina 
1 Australia 
magnetron sputtering coating line glass Photos Catalog - page 17 - WorldBid B2B Market
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Titanium Sputtering TargetsMetals - Titanium - Baoji Mingkun Nonferrous Metal Co.,Ltd - China - April 28, 2014 - contact company for priceDescription: MINGKUN specializing in the production of titanium, nickel, zirconium, molybdenum, tantalum, niobium special coating target, target pipe, target disc, target plate and custom design size. Materials: Titani um, Niobium, Nickel, Zirconium,...
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Aluminum Sputtering TargetMetals - Aluminum - Changsha Xin Kang Advanced Materials Corporation. - China - June 6, 2016 - 50.00 Dollar US$Products: Metal sputtering targets: Mg, Al, Si, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Y, Zr, Nb, Mo, Ru, Ag, In, Sn, Sb, Te, La, Hf, Ta, W, Re, Au, Gd, Tb, Dy, Yb, Ce, Nb, Sm Metal alloy sputtering targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe,...
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Aluminum Oxide Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - November 14, 2012 - contact company for priceCeramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Planar Metal Sputtering TargetsGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various pu...
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Sputtering Targets Nife Mgf2Electronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - September 7, 2012 - contact company for price
As a major supplier of materials, Leadmat Advanced Materials Co., Ltd can offer a widly kinds of raw materials and products.include sputtering targers, evaporation materials, high pure materials, rare earth materials and advanced materials. Sputterin...
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Cuga Alloy Sputtering TargetElectronics - Manufacturing - China Leadmat Advanced Materials Co.,Ltd - China - November 4, 2014 - contact company for priceAlloy Sputtering Targets: AlCu, AlCr, AlMg, AlSi, AlSiCu, AlAg, AlVMoMn, CeGd, CeSm, CrSi, CoCr, CoCrMo, CoFe, CoFeB , CoNi, CoNiCr, CoPt, CoNbZr, CoTaZr, CoZr, CrV, CrB, CrSi, CrCu, CuCo, CuGa, CuIn, CuNi, CoNiPt, CuZr, DyFe, DyFeCo, FeB, FeC, FeMn,...
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Planar Alloy Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various purity levels to...
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Cuga Alloys Sputtering TargetMetals - Copper - Alloys - Changsha Xinkang Advanced Materials Co,Ltd - China - April 25, 2017 - 10.00 Dollar US$Metal alloy targets: NiFe, NiCr, NiV, TiAl, CoCr, CoFe, CoTaZr, CuGa, CuInGa, CuInGaSn, ZnSn, CuZn, CuNi Specification: Densi ty: Hi-density Error: Min-error Purity: 99.9%-99.9995% Shapes: rings, circular, rectangular, cathode, Custom-made Size: supp...
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Optical Coatings And Sputtering TargetChemicals - Dioxide - Shanghai Spark Advanced Material Co., Ltd - China - November 12, 2019 - contact company for priceShape Size Color Purity Package Granule 1~3mm Colorless 99.99% 1000g 2~4mm 3~5mm Rod Φ2x2mm Φ3x3mm Sphere 2.5mmD Circular Φ25x10mm Φ30x12mm Silicon Monoxide(SiO) granule;1~3mm;2~4mm;3~5mm ;8~40mm;99.99% Silicon Dioxide(SiO2) granule;1~3mm;2~4mm;3~5mm...
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Rotary Metal Sputtering TargetsGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various pu...
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Planar Ceramic Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various ...
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Sputtering Target Zinc OxideComponents - Other - China Leadmat Advanced Materials Co.,Ltd - China - August 21, 2012 - contact company for price
Ceramic Sputtering Targets 1, Boride Ceramic Sputtering Targets: Cr2B, CrB, CrB2, Cr5B3, FeB, HfB2 , LaB6, Mo2B, Mo2B5 , NbB, NbB2, TaB, TaB2, TiB2, W2B, WB, VB, VB2, ZrB2 2, Carbide Ceramic Sputtering Targets : B4C, Cr3C2, HfC, Mo2C, NbC, SiC, TaC, ...
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Titanium Nitride Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Titanium Nitride (TiN) sputtering target flim Molecular formula: TiN Color: gold color Brand Name: CRM Purity: 99.5%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density...
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Molybdenum Sulfide Sputtering TargetMetals - Other - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for price
Name: Molybdenum Sulfide (MoS2) sputtering target flim Molecular formula: MoS2 Color: black Brand Name: CRM Purity: 99.9%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative Density:...
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Nickel Chromium Sputtering TargetMetal Manufacturing - Changsha Xinkang Advanced Materials Co,Ltd - China - May 2, 2017 - 20.00 Dollar US$
Product Name Nickel Chromium Sputtering Target, Pure Metal Sputtering Target, Manufacturer Metal Sputtering Target, Low price Manufacturer Metal Sputtering Target Element Symbol Ni + Cr Purity 3N, 3N6, 4N Availble Shape Planar target, Rotary target S...
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Tungsten Carbide Sputtering TargetAutomobiles - Advanced Targets Materials Co., Ltd - China - January 2, 2025 - 1.00 Dollar US$Tungsten Carbide A Tungsten Carbide Sputtering Target is a high-performance material commonly used in thin-film deposition processes, particularly in physical vapor deposition (PVD) applications. These sputtering targets are composed of tungsten carb...
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Ito Target Granules SputteringMetals - Other - King Metal Industrial Limited - China - May 2, 2013 - contact company for priceITO target，ITO, high density We can also supply of ITO granules, Indium ingot, Indium foil, Indium wire, Indium beads, Indium powder, AZO Target, IGZO Target etc. Our products and services are as below: 1, High purity and Stable quality. ITO P...
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Molybdenum Niobium Sputtering TargetMetals - Molybdenum - China Rare Metal Material Co., Ltd - China - October 29, 2013 - contact company for priceName: Molybdenum Niobium sputtering target Molecular formula: Mo(90)Nb(10)wt%, MoNb Color: black Brand Name: CRM Purity: 99.95%min biggest size: Disc 18 inch （457.2mm) diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or 330x330mm Relative De...
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Titanium Dioxide Sputtering TargetChemicals - Dioxide - China Rare Metal Material Co.,Ltd. - China - November 30, 2013 - contact company for priceProduct name: Titanium Dioxide (TiO2) Sputtering Targets film Purity---99.9%, 99.95%, 99.99% Refractive index --- 2.5-2.9 Shape--- Discs, Plate, Step (Dia≤200mm, Thickness≥1mm) Rec tangle, Sheet, Step (Length≤300mm, Width≤200m...
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Rotary Ceramic Sputtering TargetGeneral Manufacturing - Fujian Acetron New Materials CO. , Ltd - China - June 4, 2024 - contact company for priceExcellent properties such as high purity, high density, Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very high purity, to ensure the stability and reliability of the material.We have various ...